What are the typical reclaim treatment processes available?

The process designs are depending on the segregated streams available. The typical contamination coming from semiconductor fabs are first and second rinse streams with contaminants containing free mineral acids (HF, HCl, H2SO4, HNO3, H3PO4), Ammonia, hydrogen peroxide, ozone, organics (mostly IPA). For these contaminants classical processes like: Activated carbon, catalysts (H2O2), ion exchange, reverse osmosis, adsorption, desorption, biofilter are mostly used and available.

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